Semiconductor
Air Purification Solution for Pharmaceutical Industry
Challenges Facing The Semiconductor Industry
-
Nanoscale Contamination
Particles smaller than 20nm cause chip defects at advanced nodes (e.g., 3nm/5nm processes). -
Airborne Molecular Contamination (AMC)
Chemical vapors (acids, dopants) corrode sensitive EUV lithography optics and wafers. -
Electrostatic Discharge (ESD) Risks
Uncontrolled static charges damage microcircuits during handling and fabrication. -
Unstable Temperature & Humidity
Lithography processes require ±0.1℃ temperature control and ±2% RH stability. Fluctuations cause material expansion/contraction, misalignment, and coating inconsistencies.
Our Solutions
Semiconductor Industry Pain Points
In advanced semiconductor manufacturing, clean air systems must simultaneously address four major challenges: particulate contamination, airborne molecular contaminants (AMC), high energy consumption, and operational stability. As illustrated, our solution deploys FFUs, ULPA filtration units, tool-mounted EFU mini-environments, and chemical filtration modules with precision in key Fab areas. This creates a comprehensive, layered cleanroom ecosystem: top-level unidirectional airflow ensures macro-environment control; localized mini-environments safeguard core processes; AMC management eliminates hidden risks; while low-resistance, high-efficiency designs reduce pressure drop and energy usage. Together, this holistically ensures high yield rates and sustainable production for nanoscale processes.
